Acid-resistant copolymer and photographic element...

Details Acid-resistant copolymer and photographic element... Acid-resistant copolymer and photographic element...

C - Chemistry, Metallurgy

08

F

96/150, 96/266,

C08F 16/06 (2006.01) C08F 8/14 (2006.01) C08F 18/10 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1099849

Abstract A photocrosslinkable polymer and imaging element containing said polymer are described wherein acid resistance is achieved by vinyl ester recurring units. A process for etching an element so prepared features exposure, development, and etching in an acid bath.

264871

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