C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 5/02 (2006.01) C07F 7/10 (2006.01) C07F 9/54 (2006.01) C07F 9/655 (2006.01) C08F 2/50 (2006.01) C09B 19/00 (2006.01) C09B 21/00 (2006.01) C09B 23/06 (2006.01) C09B 57/00 (2006.01) C09B 69/06 (2006.01) C09D 5/32 (2006.01) G03F 7/029 (2006.01)
Patent
CA 2191051
Compounds of the formula ? Image (?) in which R1 is, for example, C1-C20alkyl or phenyl-C1-C6alkyl which radicals are unsubstituted or substituted; R2, R3 and R4 independently of one another are phenyl or biphenyl, which radicals are unsubstituted or substituted; wherein the sum of the Hammett .sigma. constants (.SIGMA..sigma.) of the substituents on the aromatic radicals R2, R3 and R4 is between +0.36 and +2.58; R8, R9, R14, R15 and R16 are, for example, C1-C12alkyl, phenyl-C1-C6alkyl or phenyl, and G is a radical which is able to form positive ions are suitable as photoinitiators for photopolymerizable compositions which contain acid groups, in the presence of a coinitiator if desired.
Cunningham Allan Francis
Kunz Martin
Kura Hisatoshi
Ag Ciba-Geigy
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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