C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 8/28 (2006.01) G03F 7/021 (2006.01) G03F 7/023 (2006.01)
Patent
CA 2113201
ACID-SUBSTITUTED TERNARY ACETAL POLYMERS AND USE THEREOF IN PHOTOSENSITIVE COMPOSITIONS AND LITHOGRAPHIC PRINTING PLATES ABSTRACT OF THE DISCLOSURE Novel acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid- substituted alkyl group or an acid-substituted aryl group. The acid-substituted ternary acetal polymers are advantageously employed in photosensitive compositions in which they are utilized in combination with diazo resins. Such photosensitive compositions are especially well adapted for use in lithographic printing plates which can be developed with aqueous developing solutions.
Le Boeuf Larry Delore
Walls John E.
Eastman Kodak Company
Gowling Lafleur Henderson Llp
LandOfFree
Acid-substituted ternary acetal polymers and use thereof in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Acid-substituted ternary acetal polymers and use thereof in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Acid-substituted ternary acetal polymers and use thereof in... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1561429