Acidic bath for electrolytically depositing a copper deposit...

Details Acidic bath for electrolytically depositing a copper deposit... Acidic bath for electrolytically depositing a copper deposit...

C - Chemistry, Metallurgy

07

D

C07D 241/46 (2006.01) C25D 3/38 (2006.01)

Patent

CA 2542356

For manufacturing particularly uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density, halogenated or pseudohalogenated monomeric pheanzinium compounds or a purity at least 85 mole-% and having the general chemical formula (I) are utilized in which R1, R2, R3, R4. R5, R6, R7, R7~~, R8, R9, X and A.macr.have the significations denoted in the claims. The compounds are prepared by diazotizing a suited starting compound prior to halogenating or pseudohalogenating it in the presence of mineral acid, diazotization means and halide or pseudohalide, with the reaction steps being run in one single vessel.

L'invention concerne un procédé de fabrication de revêtements de cuivre particulièrement uniformes et au fini brillant spéculaire, nivelés et ductiles, et à densité de courant relativement élevée, consistant à utiliser des composés de phénazinium halogénés ou pseudohalogénés monomériques d'une pureté d'un pourcentage molaire d'au moins 85 %, et représentés par la formule chimique générale (I) dans laquelle R?1¿, R?2¿, R?3¿, R?4¿. R?5¿, R?6¿, R?7¿, R?7''¿, R?8¿, R?9¿, X et A.macr. sont tels que définis dans les revendications. Ces composés sont préparés par diazotation d'un composé de départ adapté avant l'halogénation ou la pseudohalogénation de celui-ci en présence d'un acide minéral, de moyens de diazotation et d'un halogénure ou pseudohalogénure, les étapes de la réaction étant mises en oeuvre dans un seul récipient.

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