Acidic composition and process of using same

Details Acidic composition and process of using same Acidic composition and process of using same

C - Chemistry, Metallurgy

11

D

C11D 7/26 (2006.01) B05D 3/10 (2006.01) B08B 3/08 (2006.01) C09D 9/00 (2006.01) C11D 7/08 (2006.01) C11D 7/32 (2006.01) C11D 7/50 (2006.01) C11D 17/00 (2006.01)

Patent

CA 2112643

ABSTRACT OF THE DISCLOSURE Acidic compositions having pH ranging from about 2.0 to about 5.0 are described which comprise a water- soluble organic solvent, an acid present in sufficient amount to provide the desired pH, and water. Preferably, the compositions comprise an organic acid present in an amount to render the composition pH from 2.0-5.0, a combination of water-soluble glycol ether solvents having differing numbers of ether groups, with the balance being water. The compositions are advantageous in that they do not require surfactants, couplers or other wetting agents to remove coatings containing polymers having free amine groups.

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