C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 3/48 (2006.01) A01N 31/02 (2006.01) A01N 31/04 (2006.01) A01N 31/14 (2006.01) A01N 37/36 (2006.01) C11D 3/20 (2006.01) C11D 3/43 (2006.01) C11D 17/04 (2006.01)
Patent
CA 2433663
A low residue antimicrobial solution containing about 0.2 percent by weight of an acid selected from the group consisting of organocarboxylic acids; and about 2 percent of a volatile solvent selected from the group consisting of n- butanol, benzyl alcohol, phenylethanol, and sparingly soluble glycol ether solvents is disclosed. Preferred compositions may also contain about 0.1 percent anionic sulfated or sulfonated surfactants and about 5 percent co- solvent selected from the group consisting of completely water soluble monoprotic aliphatic alcohols and glycol ethers. The solution may be also employed as a low residue cleaner for soiled hard surfaces. Premoistened wipes comprising said solutions are also disclosed.
L'invention concerne une solution antimicrobienne à résidu faible, contenant environ 0,2 mole pour cent en poids d'un acide choisi parmi le groupe comprenant des acides carboxyliques, et environ 2 pour cent d'un solvant volatil choisi parmi le groupe comprenant le n-butanol, l'alcool benzylique, le phényléthanol, et des solvants d'éther de glycol peu solubles. Des compositions préférées peuvent aussi contenir environ 0,1 pour cent de tensioactifs anioniques sulfatés ou sulfonés et environ 5 pour cent d'un co-solvant choisi parmi le groupe comprenant des alcools aliphatiques et des éthers de glycol monoprotiques totalement hydrosolubles. La solution peut être aussi utilisée en tant que produit de nettoyage à faible teneur en résidu pour des surfaces dures souillées.
Hilgers Debra S.
Rees Wayne M.
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
S.c. Johnson & Son Inc.
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