C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/62 (2006.01) C11D 1/68 (2006.01) C11D 1/75 (2006.01) C11D 1/94 (2006.01) C11D 3/02 (2006.01) C11D 3/20 (2006.01) C11D 3/34 (2006.01) C11D 1/40 (2006.01) C11D 1/90 (2006.01) C11D 1/92 (2006.01)
Patent
CA 2287836
The present invention relates to a liquid acidic composition having a pH below 5 and comprising from 0.1 to 70 % by weight of the total composition of an acid, and a surfactant system comprising a zwitterionic surfactant and a second surfactant selected from the group consisting of: an amine oxide, an amine which is not an amine oxide, a quaternary ammonium surfactant and mixtures thereof, at a weight ration of said zwitterionic surfactant to said second surfactant of at least 1:1. These compositions deliver excellent limescale removal performance as well as outstanding greasy soap scum cleaning on hard-surfaces.
Cette invention concerne un composition acide liquide possédant un pH inférieur à 5, laquelle contient de 0,1 à 70 % d'un acide par rapport à son poids total ainsi qu'un système tensioactif comprenant un tensioactif zwittérionique et un second tensioactif choisi dans le groupe suivant: un oxyde d'amine, une amine autre qu'un oxyde d'amine, un tensioactif à base d'ammonium quaternaire, ou des mélanges de ces éléments. Le rapport en poids du tensioactif zwittérionique par rapport au second tensioactif est d'au moins 1: 1. Ces compositions possèdent d'excellentes qualités d'élimination du tartre ainsi qu'une étonnante capacité de nettoyage de résidus de savon gras sur des surfaces dures.
Bianchetti Giulia Ottavia
Cesarone Germano
Pace Luigi
Dimock Stratton Llp
The Procter & Gamble Company
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