C - Chemistry – Metallurgy – 09 – K
Patent
C - Chemistry, Metallurgy
09
K
31/12, 166/25
C09K 3/00 (2006.01) C09K 8/72 (2006.01)
Patent
CA 1048768
ABSTRACT OF THE DISCLOSURE A process is provided whereby a subterranean formation may be treated uniformly with acid at a controlled rate to a considerable distance from an injection point. The process includes the introduction of acid absorbed on colloidal silica which usually takes the form of a free flowing apparently dry powder. This powder is slurried in a solvent, such as a light hydro- carbon fraction, to form a composition which, on contact with water in the reservoir, will liberate acid. The process allows the acid to penetrate some distance into the formation before the acid is liberated, thus having an effect similar to retarded acid and effecting a large radius around the well bore.
221843
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