C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 233/49 (2006.01) C07C 233/52 (2006.01) C07C 237/22 (2006.01) C07C 327/28 (2006.01) C07D 295/108 (2006.01) C07D 295/155 (2006.01) C08F 2/50 (2006.01) C08F 20/58 (2006.01)
Patent
CA 2173228
The invention provides novel acrylamide functional disubstituted acetyl aryl ketones and a process for their preparation in high yields uncontaminated by difunctional material. The invention further provides photo-cross-linkable compositions comprising one or more ethylenically-unsaturated monomers and as photoinitiator the acrylamide functional disubstituted acetyl aryl ketone of the invention. The compositions are useful for the preparation of films and coatings, particularly pressure- sensitive adhesive coatings.
L'invention concerne de nouvelles acétylarylcétones disubstituées fonctionnelle acrylamide et un procédé de préparation à rendement élevé non contaminé par des matériaux difonctionnels. De plus, l'invention concerne des compositions photoréticulables comprenant un ou plusieurs monomères éthyléniquement insaturés et comme photo-initiateur l'acétylarylcétone disubstituée fonctionnelle acrylamide de l'invention. Ces compositions sont utiles pour la préparation de films et de revêtements, en particulier pour la préparation de revêtements adhésifs sensibles à la pression.
Babu Gaddam N.
Bennett Greggory S.
Chen Kejian
Heilmann Steven M.
Smith Howell K. II
Minnesota Mining And Manufacturing Company
Smart & Biggar
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