C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
96/204, 402/407,
C08F 220/44 (2006.01) G03C 1/76 (2006.01) G03C 11/08 (2006.01)
Patent
CA 1236646
-i- NOVEL ACRYLONITRILE COPOLYMERS AND PROTECTIVE OVERCOATS FOR PHOTOGRAPHIC ELEMENTS Abstract of the Disclosure Novel polymers having the structure Image and Image ; wherein A represents a polymerized acrylonitrile monomer; B represents a polymerized hydrophobic ethyleni- cally unsaturated monomer; C represents a polymerized cationically charged vinylidene monomer; x is from 10 to 90 weight percent; y is from 5 to 40 weight percent except that when B is a vinylidene halide monomer, y is 10 to 89.9 weight percent; and z is from 0.1 to 10 weight percent The polymers are useful in forming protective over- coats for photographic elements.
428166
Low Howard M.
Steklenski David J.
Upson Donald A.
Eastman Kodak Company
Gowling Lafleur Henderson Llp
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