C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/125, 260/468
C08F 20/36 (2006.01) C08F 2/48 (2006.01) C08F 299/02 (2006.01) C09D 4/00 (2006.01)
Patent
CA 1196009
Abstract Radiation curable monomers having the formula Image and mixtures including the intermediate Image in which R is H or alkyl; R1 is H, alkyl, cycloalkyl, aryl or aralkyl; A and 8 are -alkyl-0-; m and n is 0 to 12; and m + n = 2 or more.
415966
Chen Albert C.
Guarino John P.
Nagy Frank A.
Gowling Lafleur Henderson Llp
Valspar Corporation (the)
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