C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 9/30 (2006.01) C08F 2/46 (2006.01) C08F 2/50 (2006.01) C08K 5/5313 (2006.01) C09D 5/32 (2006.01) C09D 11/00 (2006.01) G03F 7/029 (2006.01)
Patent
CA 2094238
(57) Abstract The invention relates to acyl- (2'-hydroxydiphenyl-2-yl)-phosphinic acid salts of formula (I) in which each of the radicals R1, R2 and R3 may be included singly or multiply and in which R1 and R2 are mutually inde- pendently hydrogen, an alkyl or al- koxy radical with 1 to 6 carbon atoms or halogen with an atomic number of 9 to 35; R3 means the same as R1/R2; Ar is an aromatic hydrocarbon radical with 6 to 10 carbon atoms; and Me is a cation of at least one alkaline metal or N(R4)4+ in which the radicals R4 are the same or different and stand for an alkyl radical with 1 to 6 carbon atoms. The invention also relates to a process for producing these compounds (I) and their use as photo- initiators in photopolymerisable materials, preferably on an aqueous basic.
Bastian Udo
Gersdorf Joachim
Kleiner Hans-Jerg
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
LandOfFree
Acyl-(2'-hydroxydiphenyl-2-yl) -phosphinic acid salts, their... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Acyl-(2'-hydroxydiphenyl-2-yl) -phosphinic acid salts, their..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Acyl-(2'-hydroxydiphenyl-2-yl) -phosphinic acid salts, their... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2065929