C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/211, 260/235
C07D 498/18 (2006.01) A61K 31/495 (2006.01)
Patent
CA 2011172
Acyl derivatives Abstract The invention relates to novel acyl derivatives of rifamycins of the formula Image (I) and the salts thereof, in which the structural elements -A1-Ar-,-A3-A4- and -A5-A6- each denote ethylene or vinylene or the elements -A1-A2- and -A3-A4- each denote ethylene and -A5-A6- denotes vinylene; X represents Image or Image and R6 denotes hydrogen or alkyl; alk denotes an aliphatic hydrocarbon radical; R1 denotes hydrogen or acyl; R2 denotes acyl, and R3 and R3' represent a common bond, or R3 denotes hydrogen or acyl, and R3' is hydrogen; R4 denotes hydrogen, cycloalkyl or aryl; R5 denotes hydrogen or acetyl; R7 denotes hydrogen or alkyl, which can be used as active compounds in medicaments, the preparation and use thereof, and pharmaceutical products and the preparation thereof.
Borel Christian
Chen Jen
Kump Wilhelm
Veenstra Siem J.
Ag Ciba-Geigy
Borel Christian
Chen Jen
Fetherstonhaugh & Co.
Kump Wilhelm
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