C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/237.2
C07D 498/18 (2006.01)
Patent
CA 1159054
-10- AHP-7681 ABSTRACT OF THE DISCLOSURE Disclosed are monoacyl and diacyl derivatives of rapamycin, processes for their preparation, methods of using the derivatives and pharma- ceutical compositions of the derivatives. The derivatives are useful, inter alia, as antifungal antibiotics.
382848
Inc. Ayerst Mckenna & Harrison
Swabey Ogilvy Renault
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