C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 487/08 (2006.01) A61K 31/55 (2006.01) C07D 295/03 (2006.01) C07D 295/073 (2006.01) C07D 295/096 (2006.01) C07D 487/18 (2006.01)
Patent
CA 2187542
Image (?) A compound represented by general formula (?) or an innocuous salt thereof, a process for producing the same, and a schizophrenia remedy containing the same as the active ingredient (wherein the nitrogeneous ring B represents 3-azabicyclo [3.2.2 ] nonan-3-yl or 4-azatricyclo [4.3.1.1 3.8 ] undecan-4-yl: and R represents hydrogen, lower alkyl, lower alkoxy, hydroxy or halogen). The above compound and salt have a high affinity for sigma-binding sites and are useful as an antischizophrenic drug.
Composé de formule générale (1) ou sel inoffensif dudit composé, procédé de production dudit dérivé et remède contre la schizophrénie contenant ledit dérivé en tant que principe actif. Dans la formule (1), l'anneau B azoté représente 3-azabicyclo[3.2.2]nonan-3-yle ou 4-azatricyclo[4.3.1.1?3,8¿]undecan-4-yle et R représente hydrogène, alkyle inférieur, alcoxy inférieur, hydroxy ou halogène. Les composés et sel susmentionnés ont une affinité élevée pour des sites de liaison sigma et sont utiles en tant que médicament contre la schizophrénie.
Mochizuki Daisuke
Takahashi Nobuyuki
Asahi Kasei Kogyo Kabushiki Kaisha
Goudreau Gage Dubuc
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