C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/235.95
C07D 295/22 (2006.01) C07D 213/77 (2006.01) C07D 215/42 (2006.01) C07D 233/80 (2006.01) C07D 295/30 (2006.01)
Patent
CA 1120471
- 1 - ABSTRACT The invention provides novel 1- or 2 adamantylmethyl hydrazines of the general formula A Image A In this formula Ad is 1- or 2-adamantyl, R1 and R2 are the same or different and are eah hydrogen or a lower unsubstituted or substituted alkyl group of 1-4 carbon atoms; R3 and R4 are the same or different and are each hydrogen, an unsubstituted or substituted radical being a lower alkyl group of 1-4 carbon atoms a lower alkanoic acid radical of 2-4 carbon atoms or a lower alkyl ester thereof, adamantyl, aryl, aralkyl in which the alkyl moiety has 1-4 carbon atoms or R3 and R4 together with the nitrogen to which they are attached form an unsubstituted or substituted heterocyclic radical of aromatic character; or R3 and R4 together with the nitrogen atom to which they are attached form a cyclic radical of non-aromatic character. The invention further provides pharmaceutically acceptable acid addition salts of the above compounds. Several methods of preparation of the new compounds are described. The novel compounds according to the invention possess valuable antifungal (human and plant), antiviral, antiprotozoal and antimicrobial properties.
315362
Sterling Jeffrey
Suchi Raul
Weiner Ben-Zion
Yellin Haim
Gowling Lafleur Henderson Llp
Teva Pharmaceutical Industries Ltd.
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