C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
C01B 11/02 (2006.01)
Patent
CA 2548522
The present invention relates to a chlorine dioxide solution with a lowered pH allowing for the removal of mineral deposits in varying industries and for varying surfaces and systems. The chlorine dioxide solution has a pH lower than 5. A method of preparing and using a chlorine dioxide solution with lowered pH to remove mineral deposit and sanitize is also present.
La présente invention concerne une solution de dioxyde de chlore avec un pH réduit permettant de retirer des dépôts minéraux dans diverses industries et divers systèmes et surfaces. La solution de dioxyde de chlore a un pH inférieur à 5. L'invention concerne également un procédé destiné à la préparation et à l'utilisation d'une solution de dioxyde de chlore avec un pH réduit permettant de retirer un dépôt minéral et d'épurer divers systèmes et surfaces.
Crawford Charles
Kennedy Keith
Sampson Allison H.
Sampson Richard L.
Finlayson & Singlehurst
Johnsondiversey Inc.
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