C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/233, 167/244
C07D 311/24 (2006.01) A61K 31/35 (2006.01) A61K 31/41 (2006.01) C07D 405/04 (2006.01)
Patent
CA 2025471
CA - 4-17748/+ Additional further novel alkanophenones Abstract p-Substituted alkanophenones of the general formula Image (I), wherein R1 is unsubstituted or fluorinated lower alkyl, R2 is hydrogen, unsubstituted or fluorinated lower alkyl or lower alkenyl, X is lower alkylene, oxy, thio or a direct bond, alk is lower alkylene, n is 1 or 2, R3 is unsubstituted or chlorinated polyfluoro-lower alkyl, R4 is free, esterified or amidated carboxy or 5-tetrazolyl, and R5 is hydrogen or lower alkyl, have leucotriene-antagonistic properties and can be used as anti-allergic medicinal active ingredients. The process for their preparation comprises reacting an epoxide of formula Image (II), wherein R1, R2, X, alk, n and R3 are as defined above, with a thiol of formula Image (III), wherein R4 and R5; are as defined above, or with a salt thereof, and, if desired, converting a compound obtainable in accordance with the process into a different compound of formula I, separating a stereoisomeric mixture obtainable in accordance with the process into the components and/or converting a free compound obtainable in accordance with the process into a salt or convening a salt obtainable in accordance with the process into the free compound or into a different salt.
Lang Robert W.
Schaub Bruno
von Sprecher Andreas
Ag Ciba-Geigy
Fetherstonhaugh & Co.
Lang Robert W.
Schaub Bruno
von Sprecher Andreas
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