G - Physics – 03 – B
Patent
G - Physics
03
B
95/25
G03B 27/00 (2006.01) G03F 7/20 (2006.01) G03F 7/38 (2006.01)
Patent
CA 2039811
Abstract of the Disclosure An aftertreatment apparatus, for printing plates which have been exposed imagewise comprises an exposure station and a heat station which are disposed one behind the other in the direction of conveyance of the printing plates along a conveyor track through the aftertreatment apparatus. The exposure station contains a regulable radiation source for the total area exposure of the printing plates. The housing of the exposure station has an exposure aperture 13 which faces downwardly and which is covered by a filter disc. The housing of the heat station is thermally insulated at three sides and is open downwards in the direction of a reflector table across which the printing plates are fed.
Luellau Friedrich
Luellau Rolf
Zertani Rudolf
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
Luellau Friedrich
Luellau Rolf
Zertani Rudolf
LandOfFree
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