Agitated low temperature plasma soil remediation process

Details Agitated low temperature plasma soil remediation process Agitated low temperature plasma soil remediation process

B - Operations, Transporting

09

B

B09B 5/00 (2006.01) B01J 19/08 (2006.01) H04H 1/02 (2006.01)

Patent

CA 2090445

ABSTRACT OF THE DISCLOSURE The method of soil remediation using a low-temperature plasma to selectively remove organic contaminants, while at the same time leaving the morphology of the soil inorganic matrix essentially unchanged. The process involves passing the soil to be remediated through a reaction zone, usually with agitation. The reaction zone contains a flowing gas stream that is subjected to an electrical charge to form a low-temperature plasma. The gas stream is maintained at a low bulk-temperature less than about 300 C. The low-temperature plasma, as it flows over, in and around the soil, reacts with the organic contaminants to produce gases which are flushed away from the systems by the flowing gas stream. The morphology of an inorganic matrix can change due to exposure to high temperatures (in most instances, greater than about 1000 C). Because the plasma is at a low bulk temperature, the morphology of the soil inorganic matrix remains essentially unchanged.

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