Alignment device for integrated circuit manufacturing machines

Details Alignment device for integrated circuit manufacturing machines Alignment device for integrated circuit manufacturing machines

G - Physics

03

B

356/194

G03B 41/00 (2006.01) G03B 27/32 (2006.01) G03F 9/00 (2006.01) H01L 21/30 (2006.01) H01L 49/00 (2006.01)

Patent

CA 1193030

AN ALIGNMENT DEVICE FOR INTEGRATED CIRCUIT MANUFACTURING MACHINES ABSTRACT OF THE DISCLOSURE The alignment device , usable in wafer steppers, allows a reference pattern (7) carried by a reticle (1) to be aligned with an alignment pattern carried by the sili- con wafer on which the design of the reticle is to be repeat- ed. This device comprises a microscope movable in two conjugate directions x and y of the directions of movement of the reticle and of the wafer, and a sighting mirror (15). This mirror is movable between a position where it frees the path of the beam coming from an illuminator (3) and a position in which it directs an illuminating light pencil from a source (17) through the reference pattern towards the wafer and brings the reflected light back towards the microscope while causing the mean ray to pass through the object focus (F) of the photoreducing lens (4).

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