C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
402/13, 260/443.
C07F 7/18 (2006.01) C08G 77/14 (2006.01) C08G 77/18 (2006.01) G03F 7/075 (2006.01)
Patent
CA 1332243
ABSTRACT OF THE DISCLOSURE Alkali-soluble organopolysiloxanes useful in the alkali-developing resist materials for use in microprocesses in LSI device fabrication have the following general formula Image where A is a hydroxyphenyl group; R is an alkylene group having 1 to 4 carbon atoms; n is zero or one; R1 is an alkyl group having 1 to 4 carbon atoms; x and z are positive numbers; y is zero or a positive number; x, y, and z have values such that their ratios are 0.3 ? (x + y)/z ? 4; and zero ? y/x ? 5.
599934
Fukutani Yoshimi
Shirahata Akihiko
Dow Corning Toray Silicone Company Limited
Gowling Lafleur Henderson Llp
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