C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/647.8
C07C 43/30 (2006.01) C08G 65/331 (2006.01)
Patent
CA 1072584
ABSTRACT OF THE DISCLOSURE The present invention relates to a mixture of acetals having the formula: Image wherein R lS the residue of an organic compound selected from the group consisting of ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, butylene glycol, trimethylolpropane, glycerine, pentaerythritol and diglycerine, R' is an alkyl radical containing 8 to 30 carbon atoms, R" is an alkyl radical containing 1 to 6 carbon atoms, M is a hydrophilic chain of units selected from the group consisting of oxyethylene and oxyethyleneoxy- propylene units wherein the oxyethylene content of said hydrophilic chain is from about 75 to 100 weight percent and the oxypropylene content is from 0 to about 25 weight percent, a and a' are integers from 5 to 75, b and b' are integers from 1 to 2, x and y are integers whose sum is equal to b + b' wherein the ratio of x to y is from about 19:1 to 1:1, and process for obtaining the same. These compounds are useful as surfactants.
238083
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