Alkaline-etch resistant dry film photoresist

Details Alkaline-etch resistant dry film photoresist Alkaline-etch resistant dry film photoresist

G - Physics

03

F

G03F 7/038 (2006.01) G03F 7/033 (2006.01)

Patent

CA 2076727

ALKALINE-ETCH RESIST DRY FILM PHOTORESIST ABSTRACT In an aqueous-developable dry-film photoresist containing a carboxyl-group containing film-forming polymeric binder, the improvement wherein the binder is obtained by polymerizing a mixture including: (a) at least one monomer of the formula H2C=CRCOO[(CnH2n)X(CpH2p)]mR', wherein R is hydrogen or methyl and R' is a saturated C5-C12 bridged alkyl optionally substituted by at least one C1-C4 alkyl or halogen, X is oxygen or sulfur, n is 2-4, p is 0-4, m is 0-2; and (b) at least one C3-C15 .alpha.,.beta.- unsaturated carboxyl-containing or anhydride-containing monomer having 3-15 carbon atoms.

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