C - Chemistry – Metallurgy – 23 – F
Patent
C - Chemistry, Metallurgy
23
F
C23F 1/36 (2006.01) B44C 1/22 (2006.01) C23F 1/46 (2006.01)
Patent
CA 2098813
2098813 9212276 PCTABS00014 A process for etching aluminum in caustic solution capable of providing a consistently uniform matte finish like that of the never dump process, but with little waste like the regeneration process. Etching is performed in a solution containing free sodium hydroxide and dissolved aluminum in a ratio between about 0.6 and 2.1 g/l and also containing an etch equalizing agent at a temperature above about 70 ·C. Preferably, the etch solution is regenerated through a crystallization loop.
Hohn Phillip
Hunter Robert F.
Bereskin & Parr
Eco-Tec Limited
LandOfFree
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