Alkaline etching of aluminum with matte finish and low waste...

C - Chemistry – Metallurgy – 23 – F

Patent

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C23F 1/36 (2006.01) B44C 1/22 (2006.01) C23F 1/46 (2006.01)

Patent

CA 2098813

2098813 9212276 PCTABS00014 A process for etching aluminum in caustic solution capable of providing a consistently uniform matte finish like that of the never dump process, but with little waste like the regeneration process. Etching is performed in a solution containing free sodium hydroxide and dissolved aluminum in a ratio between about 0.6 and 2.1 g/l and also containing an etch equalizing agent at a temperature above about 70 ·C. Preferably, the etch solution is regenerated through a crystallization loop.

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