C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 15/08 (2006.01) C07H 15/04 (2006.01) C11D 1/04 (2006.01) C11D 1/06 (2006.01) C11D 1/66 (2006.01)
Patent
CA 2251376
A novel surfactant of formula (I): R1O(R2O)b(Z)aOCH2COO-X+ wherein R1 is a monovalent organic radical having from about 6 to about 30 carbon atoms; R2 is divalent alkylene radical having from 2 to 4 carbon atoms; Z is a saccharide residue having 5 or 6 carbon atoms; b is a number having a value from 0 to about 12; a is a number having a value from 1 to about 6; and X is an alkali metal ion.
Nouveau tensioactif défini par la formule (I): R¿1?O(R¿2?O)¿b?(Z)¿a?OCH¿2?COO?-¿X?+¿ dans laquelle R¿1? est un radical organique monovalent comportant environ 6 à environ 30 atomes de carbone, R¿2? est un radical alkylène divalent ayant de 2 à 4 atomes de carbone; Z est un résidu saccharide à 5 ou 6 atomes de carbone; b est un nombre compris entre 0 et environ 12; a est un nombre compris entre 1 et environ 6; et X est un ion métal alcalin.
Milstein Norman
Salka Barry A.
Henkel Corporation
Swabey Ogilvy Renault
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