C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/180, 260/235
C07D 498/18 (2006.01) A61K 31/535 (2006.01) C07D 498/14 (2006.01)
Patent
CA 1282780
Abstract of the Disclosure A novel rifamycin derivative having the formula (I): Image (I) wherein X1 is an alkyl group with 1 to 6 carbon atoms or a cycloalkyl group with 3 to 8 carbon atoms; X2 is a hydrogen atom or an alkyl group with 1 to 4 carbon atoms; R1 is hydrogen atom or acetyl group; A is a group represented by the formula: Image , wherein R2 is an alkyl group with 1 to 4 carbon atoms or an alkoxyalkyl group with 2 to 6 carbon atoms and R3 is an alkyl group with 1 to 6 carbon atoms or an alkoxyalkyl group with 2 to 6 carbon atoms, or a group represented by the formula: Image wherein Image is a 3 to 9 membered cyclic amino group with 2 to 8 carbon atoms, R4 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, or salts thereof, a process for preparing the same and antibacterial agents containing the same as an effective ingredient. The rifamycin derivative of the present invention having the formula (I) shows a strong antibacterial activity against the Gram-positive bacteria and the acid-fast bacteria.
542104
Hosoe Kazunori
Kano Fumihiko
Watanabe Kiyoshi
Yamane Takehiko
Yamashita Katsuji
Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
Osler Hoskin & Harcourt Llp
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