C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 9/53 (2006.01) C08J 3/28 (2006.01) G03F 7/029 (2006.01)
Patent
CA 2078722
Compounds of the formula I (see formula I) in which R1 is C1-C18alkyl, cyclopentyl or cyclohexyl, and R2 and R3, independently of one another, are phenyl which is unsubstituted or monosubstituted to tetrasubstituted by halogen, C1-C4alkyl and/or C1-C4alkoxy, with the proviso that R1 is not decyl if R2 and R3 are chlorine-substituted phenyl, are suitable for the photopolymerisation of compounds containing ethylenically unsaturated double bonds.
Koehler Manfred
Leppard David G.
Misev Ljubomir
Ag Ciba-Geigy
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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