C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 413/06 (2006.01) A61K 31/395 (2006.01) C07D 263/16 (2006.01) C07D 263/20 (2006.01) C07D 263/22 (2006.01) C07D 265/32 (2006.01) C07D 277/14 (2006.01) C07D 413/04 (2006.01) C07D 413/14 (2006.01) C07D 417/00 (2006.01)
Patent
CA 2100376
ALKYLENEDIAMINE DERIVATIVES ABSTRACT OF DISCLOSURE Disclosed are new alkylenediamine derivatives of the following formula which are effective for treatment of dysuria are disclosed: Image Image wherein R1 is hydrogen, alkyl, or a substituted or unsub- stituted phenyl, naphthyl or aromatic heterocyclic group; R2 is a substituted or unsubstituted phenyl, naphthyl or aromatic heterocyclic group; R3 and R4 represent hydrogen, alkyl, aralkyl or aryl; or R3 and R4 are combined to form one of substituted or unsubstituted 5- to 7-membered heterocyclic groups; X is oxygen, sulfur or imino; Y is oxygen or sulfur; Z is -CH2-, -CO- or -CS-; m is an integer of 0-4; n is an integer of 0-4; r is 0 or 1; and p and q represent an integer of 0-5 provided that p plus q is 1-5.
Ishida Michiko
Masaki Mitsuo
Miyake Norihisa
Shinozaki Haruhiko
Takeda Hiromitsu
Bereskin & Parr
Nippon Chemiphar Co. Ltd.
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