C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/226, 260/289
C07D 215/42 (2006.01) A61K 31/47 (2006.01)
Patent
CA 1297111
ABSTRACT HOE 86/S 005 There are described compounds of the formula Image where X is hydrogen, halogen, loweralkyl, loweralkoxy or trifluoromethyl; R is -?-R4 or -?-R4, R4 being loweralkyl; R1 is hydrogen, loweralkyl or arylloweralkyl; R2 is hydrogen, loweralkyl or arylloweralkyl; and R3 is loweralkyl, with the proviso that when R is acetyl, R3 is methyl and X is hydrogen, R1 and R2 are not both hydrogen, or pharmaceutically acceptable acid addition salts thereof, which are useful for enhancing memory and for treating Alzheimer's disease.
545157
Effland Richard C.
Klein Joseph T.
Bereskin & Parr
Effland Richard C.
Hoechst-Roussel Pharmaceuticals Inc.
Klein Joseph T.
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