Ambient-free processing system

Details Ambient-free processing system Ambient-free processing system

F - Mech Eng,Light,Heat,Weapons

24

F

F24F 9/00 (2006.01) B65G 49/07 (2006.01) C23C 16/44 (2006.01) C30B 25/14 (2006.01) C30B 31/16 (2006.01) F24F 13/00 (2006.01) H01L 21/00 (2006.01) H01L 21/677 (2006.01)

Patent

CA 2076334

An apparatus and method for processing a workpiece in an ambient-free, atmosphere of selected gas. A preparation vessel has an opening for entry of the workpiece and a diffuser oriented to emit across the vessel opening a laminar curtain flow of the selected gas which enters, purges the vessel and prevents the infiltration of air. The workpiece on its carrier is transported into the preparation vessel where air is purged out and replaced with selected gas. A processing vessel has a similar workpiece entry opening and diffuser. The preparation vessel and the processing openings are brought into coincidence, and the carrier is transported into the processing vessel for processing of the workpiece in the atmosphere of selected gas provided by the processing vessel diffuser.

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