C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/481.8
C07C 103/30 (1980.01)
Patent
CA 1142543
ABSTRACT OF THE DISCLOSURE Amide acrylate compounds are disclosed of the general formula: Image wherein X, Y and Z may each independently be H, alkyl, aryl, acrylyloxyalkyl, acrylyloxy aliphatic ester formed by reaction of acrylating material with hydroxyl terminated aliphatic ester-containing intermediate resulting from the reaction of inner ester of hydroxy carboxylic acid and amino group, or acrylyloxy aliphatic ether, and wherein X, Y and Z together have two, three or four acrylyloxy groups. The compounds are useful as resin components in very fast curing, radiation-sensitive compositions that form mar-resistant protective coatings.
307235
Dowbenko Rostyslaw
Friedlander Charles B.
Gruber Gerald W.
Borden Ladner Gervais Llp
Ppg Industries Ohio Inc.
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