C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
C08G 69/40 (2006.01) C08G 69/44 (2006.01)
Patent
CA 2063028
pR~T.~ D~ LA DIVULGATTON: La présente invention concerne des copolymères séquencés de formule Image Il sont préparés par réaction à l'état fondu entre un oligoamide diacide A, un oligoéther diol B et un coupleur diacide C de faible masse moléculaire dont les pourcentages molaires respectifs a, b et c sont tels que: - 5 a + c - b + 5 et c 3
Forichon Noelle
Maj Philippe
Elf Atochem S.a.
Robic
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