Amide block polyether and process for its synthesis

C - Chemistry – Metallurgy – 08 – G

Patent

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C08G 69/40 (2006.01) C08G 69/44 (2006.01)

Patent

CA 2063028

pR~T.~ D~ LA DIVULGATTON: La présente invention concerne des copolymères séquencés de formule Image Il sont préparés par réaction à l'état fondu entre un oligoamide diacide A, un oligoéther diol B et un coupleur diacide C de faible masse moléculaire dont les pourcentages molaires respectifs a, b et c sont tels que: - 5 a + c - b + 5 et c 3

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