C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/292, 260/291
C07D 211/06 (2006.01) C07D 211/34 (2006.01) C07D 211/60 (2006.01) C07D 211/62 (2006.01) C07D 401/12 (2006.01) C07D 409/12 (2006.01)
Patent
CA 1188302
ABSTRACT OF THE DISCLOSURE A compound of the formula, Image wherein R represents a hydrogen atom, a naphthyl, indanyl, tetrahydronaphthyl or pyridyl group, or a phenyl group which may have 1 to 3 substituents selected from the group consisting of a halogen atom, and an alkyl, alkenyl, alkoxy, alkanoyl, cyano, formyl, trifluoromethyl, phenyl, phenylalkyl, alkanoyl- amino, aminosulfonyl, carboxyl, alkoxycarbonyl, benzyloxycarbonyl, benzoylvinyl, phenylvinylcarbonyl, carboxyvinyl, and diphenyl- methyloxycarbonylvinyl group, A represents an oxygen or sulfur atom, and n represents an integer of 0 to 3, with the proviso that when n is an integer of 0, R must not be a hydrogen atom, or a pharmaceutically acceptable salt thereof is effectively useful for inhibiting a complement reaction, inflammation caused by an allergic reaction, and platelet aggregation.
403483
Kikawa Yoshio
Kondo Kaname
Muramatsu Mutsumi
Satoh Toshio
Sekine Hiroyasu
Gowling Lafleur Henderson Llp
Nippon Chemiphar Co. Ltd.
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