C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/543.7
C07D 295/215 (2006.01) C07C 279/24 (2006.01) C07C 335/16 (2006.01) C07C 335/28 (2006.01) C07C 335/34 (2006.01) C07D 203/12 (2006.01)
Patent
CA 1081710
A B S T R A C T The invention describes a novel class of chemical compounds of the formula I or its tautomeric form II when the R radical is hydrogen: Image Image II I where X, Y and Z may be the same or different and are hydrogen, halo, loweralkyl, haloloweralkyl, nitro, loweralkoxy, hydroxy, arloweralkoxy, acyloxy, cyano, haloloweralkoxy or loweralkyl- sulfonyl; R and R' are hydrogen or loweralkyl, R" and R"'are hydrogen, loweralkyl, loweralkenyl, cycloalkenyl up to 9 carbon atoms, cycloalkylloweralkyl, loweralkyl, cycloalkyl, aralkyl or loweralkynyl; R" and R"' together may form a 5-7 atom ring which may include 0-2 hetero atoms of N, 0 or S; Rn is hydrogen or loweralkyl provided at least one of R, R', R" and R"' is other than hydrogen; and non-toxic acid addition salts thereof. The novel compounds of the invention have valuable local anaes- thetic properties, while some of the compounds possess anti- diarrheal properties while others possess anti-malarial properties.
249091
Diamond Julius
Douglas George H.
Goudreau Gage & Associates
William H. Rorer Inc.
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