C - Chemistry – Metallurgy – 10 – L
Patent
C - Chemistry, Metallurgy
10
L
C10L 3/06 (2006.01) C07C 7/20 (2006.01) C09K 8/52 (2006.01)
Patent
CA 2544016
Certain substituted amines, alkylenediamines or polyamines, and derivatives of these, are suitable for use in preventing, inhibiting, or otherwise modifying crystalline gas hydrate formation. These inhibitors include compounds from any of the following groups. (see formula 1) (see formula 2) (see formula 3) (see formula 3b) (see formula 4) (see formula 5) (see formula 6) (see formula 7a) (see formula 7b) The substituents R1 - R5 may be hydrocarbyl groups or, in some cases, polyhydroxyalkyl groups or (CH2)p-COO- in which p is either 1 or 2.
Ford Michael Edward
Goddard Richard Joseph
Meier Ingrid Kristine
LandOfFree
Amine-based gas hydrate inhibitors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Amine-based gas hydrate inhibitors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Amine-based gas hydrate inhibitors will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1770128