C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/245, 260/363
C07D 307/54 (2006.01) A61K 31/34 (2006.01) C07D 307/52 (2006.01)
Patent
CA 1305714
ABSTRACT OF THE DISCLOSURE This invention relates to a novel compound represented by the formula: Image wherein R is a 4-hydroxyphenyl group, a 4-carbamoylphenyl group or a 3-methanesulfonylaminophenyl group and its salt, which have an excellent anti-ulcer effect and good stability, to a process for producing the same, and to an anti-ulcer agent containing the same.
575719
Arai Hirotoshi
Hashiba Kazuhiko
Hirai Shiro
Hirano Hiroshi
Kusayanagi Yoshikazu
Marks & Clerk
Toyama Chemical Co. Ltd.
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