C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 311/05 (2006.01) A61K 31/18 (2006.01) A61K 31/381 (2006.01) A61K 31/40 (2006.01) A61K 31/415 (2006.01) A61K 31/4164 (2006.01) A61K 31/4184 (2006.01) A61K 31/42 (2006.01) A61K 31/423 (2006.01) A61K 31/425 (2006.01) A61K 31/426 (2006.01) A61K 31/427 (2006.01) A61K 31/428 (2006.01) A61K 31/437 (2006.01) A61K 31/44 (2006.01) A61K 31/4402 (2006.01) A61K 31/4409 (2006.01) A61K 31/4436 (2006.01) A61K 31/4439 (2006.01) A61K 31/4453 (2006.01) A61K 31/451 (2006.01) A61K 31/47 (2006.01) A61K 31/472 (2006.01) A61K
Patent
CA 2650683
Disclosed is a compound represented by the formula (I) below, a pharmaceutically acceptable salt thereof, or a solvate of any of them. (I) In the formula, R1 represents an optionally substituted lower alkyl group; Y represents -S(O)n- (wherein n is 1 or 2) or -CO-; R2 represents a hydrogen or a lower alkyl; R7 represents a hydrogen or a lower alkyl; X represents a lower alkylene, a lower alkenylene, an arylene, a cycloalkylene or the like; and Z represents a lower alkyl, an optionally substituted hydrocarbon ring group, an optionally substituted heterocyclic group or the like.
La présente invention concerne un composé représenté par la formule (I) ci-dessous, un de ses sels pharmaceutiquement acceptable ou un solvate de l'un d'eux. (I) Dans la formule, R1 représente un groupe alkyle inférieur facultativement porteur d'une substitution; Y représente -S(O)n- (dans lequel n est 1 ou 2) ou -CO-; R2 représente un hydrogène ou un alkyle inférieur; R7 représente un hydrogène ou un alkyle inférieur; X représente un alkylène inférieur, un alkénylène inférieur, un arylène, un cycloalkylène ou un composé similaire; et Z représente un alkyle inférieur, un group à cycle hydrocarboné facultativement porteur d'une substitution, un groupe hétérocyclique facultativement porteur d'une substitution ou un composé similaire.
Kouyama Naoki
Okuno Takayuki
Sakagami Masahiro
Mccarthy Tetrault Llp
Shionogi & Co. Ltd.
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