C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 211/27 (2006.01) A61K 31/135 (2006.01) C07C 211/26 (2006.01) C07C 211/35 (2006.01) C07C 215/28 (2006.01) C07C 215/30 (2006.01) C07C 223/02 (2006.01) C07C 225/16 (2006.01) C07C 225/26 (2006.01)
Patent
CA 2339634
Amine derivatives represented by general formula (1) or their salts, wherein R1 represents C1-4 alkyl; R2 represents (i), or (ii), (iii); R3 represents C1- 3 alkyl, hydroxylated C1-5 alkyl, C1-5 acyl, C2-5 alkenyl or halogeno; and k, l and m are each an integer of 1 to 4. Because of being excellent in antifungal effect, these compounds are highly useful as antifungal agents, antifungal compositions, drugs, etc.
L'invention concerne des dérivés d'amine représentés par la formule générale (1), ou leurs sels. Dans la formule, R?1¿ est alkyle en C¿1-4?; R?2¿ représente (i), ou (ii); (iii); R?3¿ est alkyle en C¿1-3? , alkyle en C¿1-5? hydroxylé, acyle en C¿1-5?, alcényle en C¿2-5? ou halogéno; et k, l et m sont chacun un nombre entier compris entre 1 et 4. Ces composés possédant d'excellents effets antifongiques sont très utiles comme agents antifongiques, compositions antifongiques, médicaments, etc.
Itoh Takao
Kawazu Yukio
Majima Toshiro
Nakashima Takuji
Nozawa Akira
Gowling Lafleur Henderson Llp
Pola Chemical Industries Inc.
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