C - Chemistry – Metallurgy – 10 – L
Patent
C - Chemistry, Metallurgy
10
L
253/105, 260/609
C10L 1/222 (2006.01) C10L 1/224 (2006.01)
Patent
CA 1180031
Abstract of the Disclosure Amine salts of low molecular weight polymaleic acids, acid amines having the formula Image wherein R1 and R2 are the same or different and selected from the group consisting of hydrogen, 9 to 20 carbon atom alkyl or alkenyl groups and R3 is selected from the group consisting of 9 to 20 carbon atoms alkyl or alkenyl groups.
388536
Jakob Claus P.
Oppenlaender Knut
Schwartz Erich
Stork Karl
Vogel Hans-Henning
Basf Aktiengesellschaft
Robic Robic & Associes/associates
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