C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/125, 260/386
C08F 2/50 (2006.01) A61K 6/083 (2006.01) C07C 275/24 (2006.01) C08F 20/36 (2006.01)
Patent
CA 1235424
ABSTRACT Compounds of the formula Image in which R represents hydrogen or a methyl group, Y1 represents an optionally branched alkylene radical with 1 to 6 C atoms, Y2 represents an optionally branched alkylene radical with 2 to 8 C atoms, X denotes oxygen or an -NH- group, R1 and R2 are identical or different and denote hydrogen, or an alkyl, alkenyl, cycloalkyl, cycloalkenyl, aryl, aralkyl or alkylaryl group which has 1 to 11 C atoms and is optionally sub- stituted by one or more, hydroxyl, amino, epoxide, urethane, urea, ester or ether groups, or R1 and R2 together form a 3-membered to 6- membered ring, which optionally contains nitrogen, oxygen or sulphur as hetero-atoms, R3 has the meaning of R1 or represents a group Image or R2 and R3, together with the Image group, form a 5-membered or 6-membered ring, which optionally contains oxygen as a further hetero- atom, and R4 and R5 are identical or different and represent hydrogen, an all or alkenyl group which has 1 to 10 C atoms and is optionally substituted by halogen, or halogen function as activators in the free radical polymerization of olefinically unsaturated monomers.
469760
Arlt Dieter
Klein Gerhard
Meier Helmut-Martin
Suling Carlhans
Winkel Jens
Aktiengesellschaft Bayer
Fetherstonhaugh & Co.
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