C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
167/179, 260/471
C07K 5/06 (2006.01) A61K 31/215 (2006.01) C07C 323/60 (2006.01) C07C 327/32 (2006.01) C07D 213/75 (2006.01) C07D 213/83 (2006.01) C07D 239/42 (2006.01) C07D 243/16 (2006.01) C07D 277/82 (2006.01) C07D 307/88 (2006.01) C07D 317/32 (2006.01)
Patent
CA 1330613
ABSTRACT Compounds of the formula: Image (wherein R1 is hydrogen or alkyl; R2 is an optionally substituted carbocyclic or heterocyclic ring: Z is hydrogen or a group -COR9, (R9 is alkyl or phenyl) Image , Image , Image , Image , Image in which R10 is hydrogen, halogen, trihalomethyl, alkyl or alkoxy, R11 and R12 are each hydrogen, alkyl or phenyl substituted by R10, or R11 and R12 together represent alkylene and p is 1 or 2; q is 1 to 4; A is phenyl or cycloalkyl optionally substituted by halogen, trihalomethyl, alkyl or alkoxy; and m is zero and n is 1 to 4 or n is zero and m is 1 to 4; and non-toxic salts thereof, have an inhibitory effect on enkephalinase and are useful as analgesic, antianxiety and anticonvulsant agents.
598418
Aishita Hideki
Arai Yoshinobu
Kawamura Masanori
Mccarthy Tetrault Llp
Ono Pharmaceutical Co. Ltd.
LandOfFree
Amino acid derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Amino acid derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Amino acid derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1287116