C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/279.3, 260/3
C07D 407/06 (2006.01) A61K 31/34 (2006.01) C07D 207/08 (2006.01) C07D 275/03 (2006.01) C07D 295/14 (2006.01) C07D 307/38 (2006.01) C07D 307/52 (2006.01) C07D 307/64 (2006.01)
Patent
CA 1099268
ABSTRACT OF THE DISCLOSURE Compounds of the general formula I: Image (I) and physiologically acceptable salts thereof and N-oxides and hydrates, in which R1 and R2 which may be the same or different represent hydrogen, lower alkyl, cycloalkyl, lower alkenyl, aralkyl or lower alkyl interrupted by an oxygen atom or a group Image , in which R4 represents hydrogen or lower alkyl or R1 and R2 may, together with the nitrogen atom to which they are attached, form a heterocyclic ring which may contain other heteroatoms selected from 0 and Image ; R3 is hydrogen, lower alkyl, lower alkenyl or alkoxyalkyl; X is -CH2-, O or S; Y represents = S, = O, = NR5 or = CHR6; Alk denotes a straight or branched alkylene chain of 1 to 6 carbon atoms; R5 is H, nitro, cyano, lower alkyl, aryl, alkylsulphonyl, or arylsulphonyl; R6 represents nitro, arylsulphonyl or alkylsulphonyl; m is an integer from 2 to 4; and n is 1 or 2; or when X = S, or -CH2-, n is zero, 1 or 2. These compounds have H2-antagonist activity. Intermediates in the production thereof are also provided. -1-
283694
Bradshaw John
Clitherow John W.
Price Barry J.
Allen Hanburys Limited
George H. Riches And Associates
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