C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 231/56 (2006.01) A61K 31/416 (2006.01) A61P 25/00 (2006.01) C07D 401/04 (2006.01) C07D 405/04 (2006.01) C07D 409/04 (2006.01) C07F 7/18 (2006.01)
Patent
CA 2478542
The invention relates to novel indazole derivatives having general formula (I): wherein R is O, S or NH; R3 is an alkyl, aryl, arylalkyl, heteroaryl, heteroarylalkyl, aryl, heterocycle, cycloalkyl, alkenyl, etc. radical; said radicals being optionally substituted with 1 or more substituents; R4, R5, R6 and R7 are selected independently from the following radicals: hydrogen, halogen, CN, NO¿2?, NH¿2?, OH, COOH, C(O)OR8, -O-C(O)R8, NR8R9, NHC(O)R8, C(O)NR8R9, NHC(S)R8, C(S)NR8R9, SR8, S(O)R8, SO¿2?R8, NHSO¿2?R8, SO¿2?NR8R9, trifluoromethyl, trifluoromethoxy, alkyl, alcoxy, aryl, arylalkyl, heteroaryl, heteroarylalkyl, heterocycle, cycloalkyl, alkenyl, etc.; said radicals being optionally substituted with 1 or more substituents.
La présente invention concerne les nouveaux dérivés d'indazole de formule générale (I): dans laquelle: R est soit O, S ou NH; R3 est un radical alkyle, aryle, arylalkyle, hétéroaryle, hétéroarylalkyle, aryle, hétérocycle, cycloalkyle, alkényle; ces radicaux étant éventuellement substitués par 1 ou plusieurs substituants; R4, R5, R6 et R7 sont indépendamment l'un de l'autre choisis parmi les radicaux suivant hydrogène, halogène, CN, NO2, NH2, OH, COOH, C(O)OR8, -O-C(O)R8, NR8R9, NHC(O)R8, C(O)NR8R9, NHC(S)R8, C(S)NR8R9, SR8, S(O)R8, SO2R8, NHSO2R8, SO2NR8R9, trifluorométhyle, trifluorométhoxy, alkyle, alcoxy, aryle, arylalkyle, hétéroaryle, hétéroarylalkyle, hétérocycle, cycloalkyle, alkényle; ces radicaux étant éventuellement substitués par 1 ou plusieurs substituants.
Dutruc-Rosset Gilles
Halley Franck
Lesuisse Dominique
Rooney Thomas
Aventis Pharma S.a.
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
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