G - Physics – 02 – B
Patent
G - Physics
02
B
88/115, 95/94.4
G02B 5/02 (2006.01) G02B 1/04 (2006.01) G03F 1/14 (2006.01)
Patent
CA 2024618
A pellicle comprising a thin, durable film of substantially uniform thickness which absorbs less than 10% light at wavelengths between 190 and 820 nanometers, tautly adhered to one edge of an enclosed support frame, said thin film comprising amorphous fluoropolymers having a refractive index between 1.24 and 1.41. Pellicles of this type are dust defocusing covers for photomasks and reticles used to project patterns onto light sensitive substrates such as photoresist-coated semiconductor wafers which are used in the manufacture of integrated circuits.
Cette invention concerne une pellicule formée d'une couche mince durable d'épaisseur sensiblement uniforme qui absorbe moins de l0 % de la lumière aux longueurs d'ondes comprises entre 190 et 820 nanomètres et qui est collée tendue à un bord d'un cadre support intégré, ladite couche mince étant composée de fluoropolymères amorphes ayant un indice de réfraction compris entre 1.24 et 1.41. Les pellicules de ce type servent de pare-poussière défocalisant de photomasque ou de réticules utilisés pour projeter des motifs sur des supports photosensibles tels que des plaquettes semi-conductrices enduites de résine photosensible destinées à la fabrication de circuits intégrés.
Du Pont Photomasks Inc.
Sim & Mcburney
LandOfFree
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