C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 14/34 (2006.01) C23C 14/06 (2006.01) C23C 16/26 (2006.01)
Patent
CA 2458299
The present invention concerns an improved process for the deposition of amorphous hydrogenated carbon film, more specifically an improved low temperature, low power and low vacuum cathodic sputtering process. The invention also concerns the film produced by said process and articles containing an amorphous hydrogenated carbon film coating.
L'invention concerne un processus amélioré de dépôt d'un film de carbone hydrogéné amorphe, plus spécifiquement un processus de pulvérisation cathodique amélioré, à basse température, à faible puissance et sous vide peu poussé. L'invention concerne en outre le film produit selon ledit procédé et des articles contenant un revêtement par film de carbone hydrogéné amorphe.
Cirino Giuseppe A.
Goncalves Neto Luiz
Mansano Ronaldo D.
Verdonck Patrick B.
Zambom Luiz S.
Fundacao de Amparo A. Pesquisa Do Estado de Sao Paulo
Moffat & Co.
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