C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
402/150, 400/180
C08G 63/66 (2006.01) C08G 63/688 (2006.01) C08L 67/00 (2006.01)
Patent
CA 1141887
ABSTRACT OF THE DISCLOSURE An alkyd resin containing ampho-ionic groups of the formula: Image wherein A is a C1-C6 alkylene or a phenylene group, is disclosed. Said resin is prepared by reacting a polyol, a polybasic acid and an ampho-ionic compound of the formula: Image wherein A is as defined above, R1 is a hydroxyalkyl, R2 and R3 are H or alkyl optionally containing sulfo and/or hydroxyl group.
364786
Ishii Keizo
Ishikura Shin-Ichi
Mizuguchi Ryuzo
Nippon Paint Co. Ltd.
Ridout & Maybee Llp
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