C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
C25D 9/00 (2006.01) C25D 9/04 (2006.01) C25D 9/08 (2006.01) H05K 3/28 (2006.01)
Patent
CA 2387813
The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an energy enhanced process to deposit a silicate containing coating or film upon a metallic or conductive surface.
La présente invention concerne un procédé de formation d'un dépôt au-dessus d'une surface métallique ou conductrice. Ce procédé utilise un procédé à énergie accrue pour déposer un revêtement ou un film à base de silicate sur une surface métallique ou conductrice.
Dalton William M.
Hahn John
Heimann Robert L.
Price David M.
Ravi Chandran
Borden Ladner Gervais Llp
Elisha Holding Llc.
Elisha Technologies Co. L.l.c.
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