An x-ray lithography device

G - Physics – 21 – K

Patent

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Details

G21K 5/00 (2006.01) G03B 42/02 (2006.01) G03F 7/20 (2006.01) G21K 1/06 (2006.01)

Patent

CA 2399878

An invention relates to a contact lithography device and comprises a soft X- ray source (preferable as an X-ray tube 1 with a rotating anode), a half lens 2 for a divergent radiation of this source transforming to a quasi-parallel one (the said lens includes a set of channels for a radiation transporting with total external reflection, the said channels are oriented along a generatrix of barrel-shaped surfaces), the means for placing a mask 3 and a substrate 4 with a resist 5 applied on it (the said means are placed on the output face side of a half lens 2), and an absorbing filter 6 for smoothing a nonuniformity of a beam intensity of an emergent radiation of a half lens, presenting in intensity decreasing as from the center to the periphery of a beam. An absorbing filter 6 is placed between the radiation source 1 and the input face of a half lens 2, and a relationship of cross sizes of a half lens and its focal distance from the input side is chosen so that to provide a capture angle of a source radiation in the following limits: 0,7/E1.5 <= .PSI. <= 1.3/E1.5, where .PSI. is an angle of a radiation capture [rad]; E is radiation energy of the used source [keV]. The reflecting surface of the channels for a radiation transporting is made of a material which includes elements with an atomic number not more than 22, and radiation energy of the used source is 0,6-6 keV. Owing to the increased capture angle and an absorbing filter placing before the input of a half lens, efficiency of a source radiation using increases and, simultaneously, an area of a plate-substrate under processing magnifies and lens longevity increases.

Le dispositif de l'invention comprend une source de rayons X mous (1), une demi-lentille (2) destinée à transformer les rayons divergents en provenance de cette source en rayons quasi-parallèles, qui possède plusieurs canaux de transmission de rayonnement à réflexion creuse externe, orientés d'après les génératrices des surfaces bombées; il comprend aussi des moyens pour disposer un masque (3) et un substrat (4) sur lequel on a appliqué une résine (5), lesdits moyens étant disposés du côté de l'extrémité de sortie de la demi-lentille (2), et un filtre absorbant (6) pour atténuer les irrégularités d'intensité du faisceau de rayonnement de sortie de la demi-lentille. Le rapport des dimensions transversales de la demi-lentille et de sa distance focale du côté de la sortie est sélectionné de manière à ce que l'angle de capture de rayonnement de la source corresponde à l'équation suivante: 0,7/ E <1,5> </= PSI >/= 1,3/e <1,5>, dans laquelle PSI est l'angle de capture du rayonnement [rad] et E est l'énergie de rayonnement de la source utilisée [keV]. Le matériau de la surface réfléchissante des canaux de transmission de rayonnement contient des éléments dont le numéro atomique est inférieur ou égal à 22, et l'énergie de rayonnement de la source utilisée est comprise entre 0,6 et 6,0 keV.

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