Annealing method for halide crystal

C - Chemistry – Metallurgy – 30 – B

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C30B 29/12 (2006.01) C30B 11/00 (2006.01) C30B 33/00 (2006.01)

Patent

CA 2515762

Improved outgassing techniques for decreasing oxygen and water concentrations in an annealing furnace, with the result being a significant reduction if not elimination of crystal defects. At the beginning of an annealing process, an airtight chamber of the annealing furnace is evacuated and filled with an inert gas not only one time but multiple times. During the anneal, inert gas, with or without a fluorinating agent, is flowed through the chamber during the heating and cooling steps while the oxygen and water concentrations in the flowing gas are each maintained below 5 ppm and more preferably below 1 ppm.

L'invention porte sur des techniques améliorées de dégazage réduisant les concentrations en eau et en oxygène dans un four de recuit, et permettant une réduction significative sinon l'élimination des défauts de cristaux. Au début du processus de recuit, on évacue la chambre hermétique du four et on la remplit d'un gaz inerte, pas seulement une fois mais plusieurs. Pendant les étapes de réchauffe et de refroidissement du processus de recuit, le gaz inerte, additionné ou non d'un agent fluorant, circule dans la chambre ses concentration en oxygène et en eau étant toutes deux maintenues au-dessous de 5 ppm, ou mieux, de 1 ppm.

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